Industry Online Resources

Technical Papers

 


 

IDC Technical Papers, Presentations, and Articles

For 2000 (Back)

IBM Ventures Into 300mm Territory, article about IBM’s IDC-designed East Fishkill, NY facility, CleanRooms magazine; December 2000

Optimizing Fab Design and Deployment, Dario Benavides, James Duley, Blake Johnson, Michael O'Halloran, Facilities Management magazine; November 2000

Modeling of Ultrapure Water Recycle/Reclaim, Kirsten Sommer and Ralph Williams, presented to Watertech ‘99 sponsored by Ultrapure Water magazine; November 2000

Interview including IDC’s view of the state of the semiconductor industry, Engineering News-Record; November 2000

Dust in the Wind, article about IDC's expansion of a cleanroom for Cirent Semiconductor in Orlando, Florida, Cabling Business magazine; November 2000

The Future Demand for Cleanroom Technology, Michael O'Halloran, presentation to CleanRooms West 2000, Portland, Oregon; October 2000

New Directions for the Semiconductor Industry in Singapore, Michael Grappe, presentation to Ultrapure Water Asia, Singapore; October 2000

Wafer Fab Water Recovery Strategies, presentation by Larry Kuehn to SEMICON Southwest 2000, Austin, Texas; October 2000

Using Advances in Air Management Technology to Reduce Costs and Improve Performance, Dennis Grant, presentation to CleanRooms West 2000, Portland, Oregon; October 2000

Wafer Fab Water Management, Ralph Williams, Kirsten Sommer and Jack Payne, tutorial for CleanRooms West 2000, Portland, Oregon; October 2000

Opportunities for Energy Efficiencies in Cleanrooms, Dennis Grant, presentation to CleanRooms West 2000, Portland, Oregon; October 2000

Using Advances in Air Management Technology to Reduce Costs and Improve Performance, Rick Grout, presentation to CleanRooms Asia 2000, Singapore; August 2000

Lean Product-Process Development Process to Support Contractor Involvement During Design, Nuno Gil, Iris Tommelein, Bob Kirkendall, Greg Ballard, presented to the Eighth International Conference on Computing in Civil and Building Engineering, Palo Alto, California; August 2000

Busy Design Firms Wonder Who Will Do All the Work, interview including IDC’s view of the state of the semiconductor industry, Engineering News-Record; July 2000

Fab Layout Methodologies, article featuring IDC's strategies for fab layout and contamination control in 300mm manufacturing environments, CleanRooms magazine; July 2000

Contribution Of Specialty Contractor Knowledge To Early Design, Nuno Gil, Iris Tommelein, Bob Kirkendall, Greg Ballard, presented to the Eighth Annual Conference of the International Group for Lean Construction, (IGLC), Brighton, England; July 2000

Understanding Fluorine (F2) Gas Emissions And Their Control, Rod J. Gravley, presentation and paper to SEMICON West 2000 "Environmental Impact of Wafer Manufacturing Processes" technical symposium, San Francisco, California; July 2000

Interview featuring IDC's observations about issues related to microelectronics industry recovery, CleanRooms magazine; June 2000

Resolving Challenges Related to Pharmaceutical Manufacturing, Mary Ellen Champion, multiple workshops related to improving pharmaceutical project management, International Society for Pharmaceutical Engineering (ISPE) Workshop, Arlington, Virginia; June 2000

Blowing Budgets, article in CleanRooms magazine featuring IDC's application of cleanroom airflow modeling technology; May 2000

Criteria, Tools, and Practices for High-Purity Water Distribution Systems, Chris Dreyer, Sean Du, Kirsten Sommer, Ralph Williams, article in Ultrapure Water magazine; May 2000

Strategies for Responsible Industrial Growth, Dick Sheehy, presentation to annual meeting of the National Association of Office and Industrial Properties, Albuquerque, New Mexico; May 2000

Airflow Modeling Applications for Ventilation Control of Interior Spaces, presentation by Andy Solberg to a technical seminar on computerized airflow modeling sponsored by Flomerics, Santa Clara, California; April 2000

Fujitsu Microelectronics' Illumination Design Award, article on award-winning project in the Illuminating Engineering Society of North America magazine; April 2000

Deionized Water Reclaim Technology, Ralph Williams, presentation to Semiconductor Pure Water and Chemical Conference, Santa Clara, California; March 2000

Fab Layout Methodology for Future Flexibility, Tom Connolly and Monty Stranski, presentation and paper for SEMICON China 2000, Shanghai, China; March 2000

Meeting the Challenges of Site Selection, interview of Dick Sheehy in U.S. Sites and Development magazine; March 2000

Smooth Operation, article in CleanRooms magazine about an IDC-designed facility for Eaton Semiconductor in Beverly, Massachusetts; March 2000

Maintaining High-Technology Facilities, Larry Crossley, presentation and paper for SEMICON China 2000, Shanghai, China; March 2000

Energy Conservation Methods for Advanced Technology Manufacturing Facilities, participation in panel for CleanRooms East 2000, Baltimore, Maryland; March 2000

Study Benchmarks Energy Use, interview of Michael O’Halloran and Dennis Grant in CleanRooms magazine on the use of benchmarking to improve cleanroom energy efficiency; March 2000

Team Commitment - High Performance Results, Mary Ellen Champion, technical paper presented to the Carolina Chapter of the International Society for Pharmaceutical Engineering (ISPE), Durham, North Carolina; March 2000

Standards for Cleanroom Design, IDC was asked to provide industry parameters for cleanroom design for AIA-Architectural Graphics Standards (AGS), 10th Edition; March 2000

Fab Design for Future Flexibility, Michael O’Halloran, presentation and paper to SEMICON Korea 2000, Seoul, Korea; February 2000

Hunkering Down for the New Year, Dan Wilkowsky, article in SSA Journal on the impact of Y2K issues on the Internet and individual web sites; February 2000

Wastewater Reduction and Recycling in Food Processing Operations, Philippe Neuville, Northwest Food Processor’s Association, Portland, Oregon; January 2000

Using the IDEF as a Facility Planning Tool, Mary Ellen Champion, Pharmaceutical Engineering Journal; January 2000

Structural Engineering Design for Detroit Metro Airport’s Huge New Parking Structure, article in Cam magazine describing involvement of IDC affiliate Paragon Structural Design in development of one of the world’s largest parking structures; January 2000